Atomic Layer Deposition

  • Olin Hall

    Pint’s lab brings first ALD systems to Vanderbilt

    Cary Pint’s lab – Nanomaterials and Energy Devices Laboratory in Olin Hall – is close to completion and it brings to Vanderbilt its first two atomic layer deposition (ALD) systems, relatively small tools that deposit atomically thin layers of material on virtually any surface. Read More

    Apr 2, 2013