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Pint’s lab brings first ALD systems to Vanderbilt

by | Apr. 2, 2013, 2:55 PM

Cary Pint’s lab – Nanomaterials and Energy Devices Laboratory in Olin Hall – is close to completion and it brings to Vanderbilt its first two atomic layer deposition (ALD) systems, relatively small tools that deposit atomically thin layers of material on virtually any surface.


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